6 rezultati
BACKGROUND OF THE INVENTION
This invention relates to polyethercyclicpolyols having high molecular weights and to the preparation thereof. In particular, the invention relates to the preparation of polyethercyclicpolyols which, due to improved molecular properties and characteristics, permit the
CROSS-REFERENCE TO RELATED PATENT APPLICATIONS
The present application claims priority under Japanese Patent Application 2009-220087, filed on Sep. 25, 2009, the entire contents of which are hereby incorporated by reference herein.
TECHNICAL FIELD
The present invention relates to a catalyst for
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a chemically amplified positive resist composition used for a lithography in microfabrication of a semiconductor, a photomask blank, and the like, and to a resist patterning process.
2. Description of the Related
TECHNICAL FIELD
The present invention relates to a polyacetal resin composition and resin molded articles made thereof. In particular, it relates to a colored polyacetal resin composition having excellent thermal stability, suppressed formaldehyde generation and suppressed deterioration in
BACKGROUND OF THE INVENTION
Field of the Invention
The present invention relates to a polyacetal resin composition and to a sulfur-containing fuel contact body provided by a molded article of this polyacetal resin composition, and to a method of increasing acid resistance with respect to an acidic
BACKGROUND OF THE INVENTION
The disclosed technology relates to reduction of turbo sludge formation in the course of lubricating a turbo-charged, sump-lubricated internal combustion engine which is susceptible to contamination of lubricant with liquid fuel.
Modern engine lubricants are formulated to